Patterning device holding apparatus and application thereof

Details Patterning device holding apparatus and application thereof Patterning device holding apparatus and application thereof

2008-10-23

2010-11-23

Berman, Jack I (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S306000, C250S307000, C250S310000, C250S311000, C250S442110, C250S491100

Reexamination Certificate

active

07838848

ABSTRACT:
A patterning device holding apparatus includes a support platform unit with a plurality of first positioning projections and a gripper unit. The gripper unit includes a head portion and a plurality of second positioning projections disposed on the head portion, and a rolling member set at a base portion. The grapping and releasing of the patterning device is achieved by the rotation of the gripper unit about a pivot substantially parallel with the center axis of the rolling member. The first and second positioning projections corporately abut against the edges of a patterning device to fix the patterning device in place.

REFERENCES:
patent: 5357814 (1994-10-01), Sugiyama
patent: 5417589 (1995-05-01), Terada
patent: 2010/0090107 (2010-04-01), Wang et al.
patent: 2010/0165346 (2010-07-01), Wang et al.

Affiliated with

Also associated with

Rating

Patterning device holding apparatus and application thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Patterning device holding apparatus and application thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Patterning device holding apparatus and application thereof will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4250126