Patterning composition and method for patterning on a substrate

Details Patterning composition and method for patterning on a substrate Patterning composition and method for patterning on a substrate

1990-04-03

1992-12-22

Beck, Shrive

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427 96, 427123, 427305, 427229, 4274431, 427557, 427553, B05D 306, B05D 512, B05D 302, B05D 118

Patent

active

051733307

ABSTRACT:
A patterning composition is prepared by mixing a metallic salt of organic acid which separates a metal when reduced (e.g. copper (II) heptanoate), a reducing agent (e.g., 4-methoxy-1-naphthol), which shows reducing activity by being heated and loses the reducing activity by being irradiated by UV light, visible light or infrared light, gelatin and water, the composition is applied on a substrate, and the coating is irradiated by UV or visible infrared light through a mask and then heated, thereby to deposit metal in a pattern.

REFERENCES:
patent: 3094417 (1963-06-01), Workman
patent: 3094619 (1963-06-01), Grant
patent: 3369933 (1968-02-01), Shulman
patent: 3767414 (1973-10-01), Huffman
patent: 4112139 (1978-09-01), Shirk et al.
patent: 4261800 (1981-04-01), Beckenbaugh et al.
patent: 4686114 (1987-08-01), Halliwell et al.
patent: 4830668 (1989-05-01), Wundt et al.
patent: 4832989 (1989-05-01), Giesecke et al.
patent: 4847139 (1989-07-01), Wolf et al.
patent: 4882200 (1989-11-01), Liu et al.
patent: 4913768 (1990-04-01), Wolf et al.
patent: 4960613 (1990-10-01), Cole et al.
patent: 5145714 (1992-09-01), Reisman et al.
patent: 5145715 (1992-09-01), Asano et al.
Pacansky, J., Formation of Metals by Electron Beams or UV Light From Organic Acid Salt Resists, IBM Technical Disclosure Bulletin, Aug. 1977, vol. 20, No. 3, p. 1180.

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