Patterned thin film graphite devices and method for making same

Details Patterned thin film graphite devices and method for making same Patterned thin film graphite devices and method for making same

2006-03-21

2006-03-21

Nhu, David (Department: 2818)

Semiconductor device manufacturing: process

Chemical etching

C438S931000, C438S789000

Reexamination Certificate

active

07015142

ABSTRACT:
In a method of making graphite devices, a preselected crystal face of a crystal is annealed to create a thin-film graphitic layer disposed against selected face. A preselected pattern is generated on the thin-film graphitic layer. A functional structure includes a crystalline substrate having a preselected crystal face. A thin-film graphitic layer is disposed on the preselected crystal face. The thin-film graphitic layer is patterned so as to define at least one functional structure.

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