Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Reexamination Certificate
2006-10-03
2006-10-03
Bueker, Richard (Department: 1763)
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
C118S724000, C118S726000
Reexamination Certificate
active
07115168
ABSTRACT:
Scanning localized evaporation and deposition of an evaporant on a substrate utilizes a mask assembly comprised of a series of mask elements with openings thereon and spaced apart in a stack. The openings are aligned so as to direct the evaporant therethrough onto the substrate. The mask elements are heated and the stack may include a movable shutter element to block openings in adjacent mask elements. The evaporant streams are usually vertical but some may be oblique to the substrate, and they may be of different materials.
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Grantham Daniel Harrison
Jain Faquir C.
Papadimitrakopoulos Fotios
Phely-Bobin Thomas Samuel
Bueker Richard
H. C. Lin Patent Agent
Optoelectronic Systems
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