Patterned substrate and liquid crystal display provided...

Stock material or miscellaneous articles – Liquid crystal optical display having layer of specified...

Reexamination Certificate

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C428S001500, C428S001510, C428S001600, C428S001620, C428S457000, C428S698000, C349S019000, C349S033000, C349S041000, C349S042000

Reexamination Certificate

active

07029727

ABSTRACT:
A thin film transistor (TFT) is formed on an insulating substrate, and a photosensitive resin film as an interlayer insulating film is formed so as to cover the TFT. Contact holes are formed in the photosensitive resin, and smooth concave and convex portions are provided on an upper surface of the resin. A film including molybdenum nitride (MoN) and a reflective pixel electrode film are successively laminated on the photosensitive resin. The nitrogen content in the MoN film may be between 5 atomic % and 30 atomic % inclusive.

REFERENCES:
patent: 5093711 (1992-03-01), Hirakawa
patent: 5408345 (1995-04-01), Mitsui et al.
patent: 5430320 (1995-07-01), Lee
patent: 5831281 (1998-11-01), Kurogane et al.
patent: 6043859 (2000-03-01), Maeda
patent: 2002/0047947 (2002-04-01), Hur et al.
patent: 6-75238 (1994-03-01), None
patent: 9-148586 (1997-06-01), None
patent: 11-258625 (1999-09-01), None

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