Patterned resist and process

Details Patterned resist and process Patterned resist and process

1986-06-10

1988-04-12

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Structurally defined

430 15, 430 18, 430312, 430322, 430325, 430326, 430394, G03C 300, G03C 500

Patent

active

047374250

ABSTRACT:
A patterned image including on a substrate, a patterned image of a first resist polymeric material and patterned image of a second and different resist material on the first resist polymeric material. The polymeric material contains reactive hydrogen functional groups and/or reactive hydrogen precursor groups. At least the surface layer of the delineated and uncovered first resist polymer material is reacted with a multifunctional organometallic material containing at least two functional groups that are reactive with the functional groups of the polymeric material.

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