Patterned mask holding device and method using two holding...

Details Patterned mask holding device and method using two holding... Patterned mask holding device and method using two holding...

2007-03-27

2007-03-27

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for original

C355S053000

Reexamination Certificate

active

10922862

ABSTRACT:
A system and method that eliminate or substantially reduce slippage of a pattern generator with respect to a pattern generator holding device during a scanning portion of an exposure operation. In first and second examples, this is done by either (a) continuously or (b) when needed concurrently using first and second pattern generator holding systems to hold the pattern generator to the pattern generator holding device. In these examples, the first pattern generator holding systems utilizes an electrostatic system to attract the pattern generator to the pattern generator holding device and the second pattern generator holding system utilizes a vacuum system to attract the pattern generator to the pattern generator holding device.

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Search Report, dated Mar. 6, 2006, for Singapore Patent Appl. No. 200505332-7, 6 pages.
English-language Abstract for Japanese Patent Publication No. JP2002233984, 1 page, data supplied from the espacenet database.

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