Patterned film of thiocarbonyl fluoride polymer

Details Patterned film of thiocarbonyl fluoride polymer Patterned film of thiocarbonyl fluoride polymer

1985-06-20

1987-04-07

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaged product

Including resin or synthetic polymer

430270, 430326, 430313, 430296, 428195, G03C 300

Patent

active

046561080

ABSTRACT:
A resist film made of thiocarbonyl fluoride polymers which has excellent sensitivity, resolving power and adhesion property to a substrate and can provide a fine resist pattern. The resist pattern is produced by forming the resist film on a substrate, irradiating an ionizing radiation and developing with an organic solvent.

REFERENCES:
patent: 2980695 (1961-04-01), Middleton
patent: 3240765 (1966-03-01), Middleton
patent: 4125671 (1978-11-01), Kakuchi et al.
patent: 4125672 (1978-11-01), Kakuchi et al.

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