Patterned deposition of thin films

Details Patterned deposition of thin films Patterned deposition of thin films

1994-09-19

1996-03-26

Beck, Shrive

Coating processes

Coating by vapor, gas, or smoke

Carbon or carbide coating

427259, 427282, 427299, 423446, C23C 1600

Patent

active

055018777

ABSTRACT:
A method for creating a patterned thin film of a high surface energy material on a substrate comprising the steps of creating a photomask pattern on the substrate using photolithography, providing an oppositely charged surface on the substrate and photomask, if such does not exist, from that of particles of the high surface energy material, removing the photomask and exposing the substrate to an aqueous colloidal suspension of particles composed of the high surface energy material to adsorb seed particles onto the surface of the substrate, or removing the photomask after adsorbing seed particles to the surface, and then depositing a uniform thin film of the high surface energy material by chemical vapor deposition onto the seeded substrate.

REFERENCES:
patent: 5082359 (1992-01-01), Kirkpatrick
patent: 5082522 (1992-01-01), Purdes et al.
patent: 5204210 (1993-04-01), Jansen et al.

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