Patterned chromate film process

Details Patterned chromate film process Patterned chromate film process

1977-03-04

1978-03-07

Tufariello, T. M.

Chemistry: electrical and wave energy

Processes and products

204192E, C25D 502, C23C 1500

Patent

active

040778517

ABSTRACT:
A process is described for putting down patterned chromate films on metal substrates. The procedure involves first forming a chromate film on the metal surface and then forming the patterned chromate film. The pattern is formed by sputtering the substrate through a suitable shadow mask. This procedure yields patterned chromate films with high dimensional tolerance limits. Such patterns are particularly useful in the fabrication of electronic artifacts, as for example, a mask in gold plating processes.

REFERENCES:
patent: 1857929 (1932-05-01), McFarland
patent: 1862231 (1932-06-01), McFarland
patent: 2028013 (1936-01-01), Reilly
patent: 3523067 (1970-08-01), Baird-Kerr et al.
patent: 3625844 (1971-12-01), McKean
patent: 3632389 (1972-01-01), Vazirani
Metal Finishing, Sept. 1975, pp. 29-35.
Journal of Electrochemical Society, vol. 120, No. 6, June 1973, pp. 735-738.
Characterization of Solid Surfaces, 1974, P. F. Kane, et al., Ed. pp. 641-660.
Protective Coatings of Metals, third Ed. 1967, ACS Monograph Series 163, R. M. Burns, pp. 27-54.
Gold Plating Technology, by F. H. Reid, et al., 1974, pp. 21-52.
Modern Electroplating, second Ed., 1963, F. W. Lowenheim, pp. 224-244.
Journal of Vacuum Science and Technology, vol. 13, No. 5, Sept./Oct. 1976, pp. 1008-1022.

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