Patterned carbon nanotube process

Details Patterned carbon nanotube process Patterned carbon nanotube process

2006-12-12

2006-12-12

Patel, Nimeshkumar D. (Department: 2879)

Electric lamp or space discharge component or device manufacturi

Process

Electrode making

C445S049000, C445S051000, C427S466000, C427S532000, C427S541000

Reexamination Certificate

active

07147534

ABSTRACT:
A patterned carbon nanotube process adopted for an electronic device is described. A negative photoresist layer is coated on a cathode substrate. A mask layer is formed with a carved cavity therein during a development process. A carbon nanotube spray is sprayed thereon to fill the carved cavity with a plurality of carbon nanotubes. The cathode substrate is sintered at a high temperature or in a vacuum to remove the mask layer and part of the carbon nanotubes adhered to the mask layer simultaneously, and to connect the rest of the carbon nanotubes firmly to the cathode conductive layer as an electron emitter layer with high resolution for increasing current density and uniformity of illumination of the electronic device.

REFERENCES:
patent: 6239547 (2001-05-01), Uemura et al.
patent: 6528020 (2003-03-01), Dai et al.
patent: 6811457 (2004-11-01), Cheng et al.
patent: 2001/0004979 (2001-06-01), Han et al.
patent: 502395 (1993-02-01), None

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