Pattern writing apparatus and pattern writing method

Details Pattern writing apparatus and pattern writing method Pattern writing apparatus and pattern writing method

2007-08-31

2009-11-03

Mathews, Alan A (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S077000, C347S239000, C347S241000, C430S322000

Reexamination Certificate

active

07612865

ABSTRACT:
Light irradiation is performed on a strip region on a photosensitive material by main scanning of an irradiation region group on the photosensitive material where light emitted from a micromirror group of a DMD is directed and light is applied to a plurality of strip regions partially overlapping in a sub scan direction in turn while repeating the main scanning, to write a pattern on the photosensitive material. When a preceding irradiation region group and a following irradiation region group pass over an overlapping area, a part of micromirrors corresponding to the overlapping area, out of the micromirror group, are made inactivated. As a result, a cumulative passage time in which the preceding irradiation region group and the following irradiation region group pass each position of the overlapping area is shorter than a passage time where the preceding irradiation region group passes each position of a non-overlapping area.

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