Pattern writing apparatus and pattern writing method

Details Pattern writing apparatus and pattern writing method Pattern writing apparatus and pattern writing method

2007-03-13

2007-03-13

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000, C250S492200

Reexamination Certificate

active

10814429

ABSTRACT:
A pattern writing apparatus for writing a pattern on a photosensitive material comprises a head provided with a DMD having a micromirror group which modulates reflected light, a stage holding a substrate, and mechanisms for moving the head and the stage relative to each other. In the pattern writing apparatus, for pattern writing, an irradiation region group on a substrate, which corresponds to the micromirror group of the DMD, is scanned in a main scanning direction that is angled relative to the direction of arrangement of the irradiation region group. The irradiation region group is also intermittently moved in the sub-scanning direction by a distance shorter than the width of the irradiation region group in the sub-scanning direction, for pattern writing of the entire substrate.

REFERENCES:
patent: 5049901 (1991-09-01), Gelbart
patent: 5291329 (1994-03-01), Wakimoto et al.
patent: 6133986 (2000-10-01), Johnson
patent: 6251550 (2001-06-01), Ishikawa
patent: 6473237 (2002-10-01), Mei
patent: 6486938 (2002-11-01), Morita et al.
patent: 6493867 (2002-12-01), Mei et al.
patent: 6537738 (2003-03-01), Mei et al.
patent: 2003/0123040 (2003-07-01), Almogy
patent: 0 528 285 (1993-02-01), None
patent: 0 556 591 (1993-08-01), None
patent: 0987875 (2000-03-01), None
patent: 62-021220 (1987-01-01), None
patent: 6-55776 (1994-03-01), None
patent: 06-083023 (1994-03-01), None
patent: 6-100829 (1994-12-01), None
patent: 2710519 (1997-10-01), None
patent: 2717035 (1997-11-01), None
patent: 10-112579 (1998-04-01), None
patent: 2875125 (1999-01-01), None
patent: 2001-133893 (2001-05-01), None
patent: 3254248 (2001-11-01), None
patent: WO 2001-500628 (2001-01-01), None

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