Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-06-07
2005-06-07
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S324000
Reexamination Certificate
active
06902852
ABSTRACT:
A half tone mask of the present invention is provided with a half tone film in which a thickness of the half tone film in a dense pattern area where optical proximity effect occurs differs from that in an isolated pattern area where the optical proximity effect does not occur, the thickness of the half tone film in the isolated pattern area being adjusted so that difference in size of a resist does not occur between the dense pattern area and the isolated pattern area due to the optical proximity effect, thus preventing the difference in size of the resist between the dense pattern area and the isolated pattern area, even when providing high definition patterns which causes the optical proximity effect.
REFERENCES:
patent: 5700606 (1997-12-01), Kobayashi et al.
patent: 5723236 (1998-03-01), Inoue et al.
patent: 5935735 (1999-08-01), Okubo et al.
patent: 6274281 (2001-08-01), Chen
patent: 9-246149 (1997-09-01), None
patent: 1998-068443 (1998-10-01), None
patent: 2000-0001481 (2000-01-01), None
Korean Office Action mailed Oct. 19, 2004 (w/English translation thereof).
Nixon & Vanderhye P.C.
Rosasco S.
Sharp Kabushiki Kaisha
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