Pattern transfer mask

Details Pattern transfer mask Pattern transfer mask

1994-11-15

1996-08-20

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, 430314, 430313, G03F 900, G03F 114

Patent

active

055477895

ABSTRACT:
A pattern transfer mask for use in an optical exposure process includes a transparent substrate having a surface; a light shielding film of a desired pattern disposed on the surface of the transparent substrate for shielding a part of a photoresist film from light transmitted through the mask and incident on the photoresist film and for transferring the desired pattern to the photoresist film; and a plurality of projections disposed at equal intervals on one side of and contacting the light shielding film pattern for reducing the intensity of light transmitted through the transparent substrate where the projections are present.

REFERENCES:
patent: 4687730 (1987-08-01), Eron
patent: 5286584 (1994-02-01), Gemmink et al.
patent: 5324600 (1994-06-01), Jinbo et al.
patent: 5397663 (1995-03-01), Uesawa et al.
IBM Technical Disclosure Bulletin, vol. 24, No. 10, p. 5063, Image Reversal Lift-Off Process, C. J. Hamel, et al., Mar. 1982.
Microelectronic Engineering, vol. 11, pp. 105-108, Fabrication of High Aspect Ratio Symmetric . . . , E. Lopez, et al., Apr. 1990.
Jap. Journal of Applied Physics, vol. 31, No. 8, pp. 2374-2381, High-Efficiency and High Reliable . . . , Sonoda et al., Aug. 1992.
IBM Technical Disclosure Bulletin, vol. 35, No. 3, pp. 191-192, MESFETs with Self-Aligned Refraction Contacts, Aug. 1992.
IBM Technical Disclosure Bulletin, vol. 19, No. 12, p. 4539, Dual Density Mask for Photoresist, May 1977.

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