Pattern transfer device and method

Details Pattern transfer device and method Pattern transfer device and method

1984-02-10

1986-03-25

Haroian, Harry N.

Optics: image projectors

Lens support

Lens position adjustable

353 28, G03B 310

Patent

active

045779457

ABSTRACT:
For the manufacture of photomasks or in order to draw a pattern on a semiconductor wafer, a step-and-repeat procedure is used. In a step-and-repeat pattern transfer device, the length of a lens barrel 1 is varied so that the reduction of a pattern original 5 is finely adjusted so that the size errors of the pattern may be corrected. The fine adjustment of the reduction is made to such an extent that the expansion of the semiconductor wafer or the like may be compensated for. In order to vary the length of the lens barrel 1, an adjustment means such as a piezoelectric element or electric motor is incorporated in the lens barrel.

REFERENCES:
patent: 3744902 (1973-07-01), Henker
patent: 4140392 (1979-02-01), Lacombat et al.
patent: 4155692 (1979-05-01), Lacombat
patent: 4190325 (1980-02-01), Moreno
patent: 4383757 (1983-05-01), Phillips
patent: 4414749 (1983-11-01), Johannsmeier
patent: 4420233 (1983-12-01), Nomoto et al.
E. W. Loebach, "VLSI Wafer Printing with Step-and Repeat Aligners", IGC Conference, Sep. 1979.

Affiliated with

Also associated with

Rating

Pattern transfer device and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern transfer device and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern transfer device and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-627556