Pattern tracer with dual scan slowdown circuit

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

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318577, G05B 100

Patent

active

046599185

ABSTRACT:
In a circular scanning pattern tracing system, a dual scanning pattern is provided to detect pattern changes in advance of the system steering axis. Pattern detection pulses from both the scanning patterns are adjustable in length and the overlap of the pulses is used to determine whether the system should slow down.

REFERENCES:
patent: 3704372 (1972-11-01), Parker et al.
patent: 3860862 (1975-01-01), Dell et al.
patent: 3883735 (1975-05-01), Murphy et al.

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