Pattern structure of photomask comprising a sawtooth pattern

Details Pattern structure of photomask comprising a sawtooth pattern Pattern structure of photomask comprising a sawtooth pattern

1996-06-11

1998-03-24

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

057311099

ABSTRACT:
The present invention can improve the limits of the resolution in a stepper by forming some portions or whole portions of the edges of the photomask pattern into a constant saw toothed structure so that the interference phenomenon of the wavelength at its maximum is offsetted.

REFERENCES:
patent: 5422512 (1995-06-01), Yamanaka
patent: 5604059 (1997-02-01), Imura et al.

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