Computer-aided design and analysis of circuits and semiconductor – Design of semiconductor mask or reticle – Analysis and verification
Reexamination Certificate
2011-03-08
2011-03-08
Dinh, Paul (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Design of semiconductor mask or reticle
Analysis and verification
C716S050000, C716S051000, C716S055000, C716S056000, C716S136000, C430S005000, C430S030000, C382S144000, C382S145000
Reexamination Certificate
active
07904853
ABSTRACT:
A method, system, and computer program product are disclosed for generating a pattern signature to represent a pattern in an integrated circuit design. In one approach, the method, system and computer program product transform pattern data, two dimensional data for the pattern, into a set of one dimensional mathematical functions, compress the set of one dimensional mathematical functions into a single variable function, compress the single variable function by calculating a set of values for the single variable function, and generate a pattern signature for the pattern from the set of values.
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Doddi Srini
Fang Weiping
Lei Junjiang
Cadence Design Systems Inc.
Dinh Paul
Nguyen Nha T
Vista IP Law Group LLP
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