Pattern recognition method

Details Pattern recognition method Pattern recognition method

1988-09-29

1989-09-12

Boudreau, Leo H.

Image analysis

Histogram processing

For setting a threshold

383 8, 250560, 356387, 356384, 358107, 364563, G06K 952

Patent

active

048667820

ABSTRACT:
According to this invention, light is radiated on a pattern to be measured while being scanned, and light reflected by the pattern is received so as to form a light intensity profile curve based on the reflection light corresponding to the pattern width of the pattern to be measured. Then, coefficients of optimal values are calculated by the method of least squares using three sets or more of pattern width values and light intensity values obtained from the light intensity profile curve. A pattern width value (X1) of the pattern to be measured is calculated using equation (II) below having these optimal values as coefficients. A very small line width of a resist film can be easily and accurately measured as a bottom value using an optical apparatus without being influenced by light interference at an edge portion of the pattern to be measured.

REFERENCES:
patent: 3936665 (1976-02-01), Donoghue
patent: 4570180 (1986-02-01), Baier et al.
patent: 4656663 (1987-04-01), Jansson et al.
patent: 4744662 (1988-05-01), Suto et al.
patent: 4811410 (1989-03-01), Amir et al.

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