Image analysis – Applications – Manufacturing or product inspection
Patent
1995-11-14
1997-04-15
Mancuso, Joseph
Image analysis
Applications
Manufacturing or product inspection
348 95, 356401, 387149, G06K 900
Patent
active
056218133
ABSTRACT:
A substrate alignment and exposure system is disclosed The alignment is performed by capturing an image of the substrate with a pattern recognition system, determining the offset from the alignment and moving the substrate relative to the reticle to be in alignment. A first optical alignment system which captures an image of a position of the substrate off of the primary axis of the exposure optics is used to perform pre-alignment. A second optical alignment system captures an image of the reticle and the substrate through the lens of the exposure optics. The pattern recognition system recognizes the alignment keys on the reticle, alignment targets on the substrate, and computes their positions and displacement from alignment. The relative alignment can be direct or inferred. Any angular and translational misalignment is calculated. The pattern recognition system then moves the substrate to be in alignment with the reticle. In the present invention, any arbitrary feature on the reticle and substrate, including device features or specialized alignment keys and targets used by other exposure systems, can be recognized by the pattern recognition system and used for alignment.
REFERENCES:
patent: 4233625 (1980-11-01), Altman
patent: 4253112 (1981-02-01), Doemens
patent: 4297676 (1981-10-01), Moriya et al.
patent: 4425037 (1984-01-01), Hershel et al.
patent: 4437758 (1984-03-01), Suzuki
patent: 4515480 (1985-05-01), Miller et al.
patent: 4650983 (1987-03-01), Suwa
patent: 4672676 (1987-06-01), Linger
patent: 4680627 (1987-07-01), Sase et al.
patent: 4687980 (1987-08-01), Phillips et al.
patent: 4723221 (1988-02-01), Matsuura et al.
patent: 4794648 (1988-12-01), Ayata et al.
patent: 4845373 (1989-07-01), Jamieson et al.
patent: 4977361 (1990-12-01), Phillips et al.
patent: 4980718 (1990-12-01), Salter et al.
patent: 5003342 (1991-03-01), Nishi
patent: 5004348 (1991-04-01), Magome
patent: 5094539 (1992-03-01), Komoriya et al.
patent: 5100237 (1992-03-01), Wittekoek et al.
patent: 5112133 (1992-05-01), Kurosawa et al.
patent: 5124927 (1992-06-01), Hopewell et al.
patent: 5264919 (1993-11-01), Tsukada
Wilczynski, J. "Optical Lithographic Tools: Current Status and Future Potential" Journal of Vac. Science Technology B5 (1), pp. 288-292, Jan./Feb. 1987.
Buckley, J. and Charles Karatzas. "Step and Scan: A Systems Overview of New Lithography Tool" SPIE vol. 1088 Optical/Laser Microlithography II, pp. 424-433, 1989.
Brown Robert L.
Jeong Hwan J.
Markle David A.
Pan David S.
Wanta Mark S.
Jones Allston L.
Mancuso Joseph
Ultratech Stepper, Inc.
LandOfFree
Pattern recognition alignment system does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pattern recognition alignment system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern recognition alignment system will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-367777