Optics: measuring and testing – Of light reflection – With diffusion
Reexamination Certificate
2005-09-13
2005-09-13
Nguyen, Tu T. (Department: 2877)
Optics: measuring and testing
Of light reflection
With diffusion
Reexamination Certificate
active
06943888
ABSTRACT:
A pattern reading apparatus reads a pattern from a reflective object. The pattern reading apparatus includes a minute-area light source, an objective lens system, a spatial filter and an imaging lens. The objective lens system causes the illumination light beam from the light source to be incident on the object and converges the light beam reflected from the object. The imaging lens forms an image of the object using a component of light which has been reflected from the object and passed through the spatial filter.
REFERENCES:
patent: 3790287 (1974-02-01), Cuthbert et al.
patent: 4314763 (1982-02-01), Steigmeier et al.
patent: 4416538 (1983-11-01), Mueller et al.
patent: 4795911 (1989-01-01), Kohno et al.
patent: 4865455 (1989-09-01), Kohno et al.
patent: 4968876 (1990-11-01), Lima
patent: 5048967 (1991-09-01), Suzuki et al.
patent: 5497234 (1996-03-01), Haga
patent: 5504317 (1996-04-01), Takahashi
patent: 5583632 (1996-12-01), Haga
patent: 5838433 (1998-11-01), Hagiwara
patent: 0702206 (1996-03-01), None
patent: 6-3625 (1994-01-01), None
patent: 6-129844 (1994-05-01), None
patent: 7-83845 (1995-03-01), None
patent: 7-107346 (1995-04-01), None
patent: 7-325036 (1995-12-01), None
Greenblum & Bernstein P.L.C.
Nguyen Tu T.
PENTAX Corporation
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