Radiation imagery chemistry: process – composition – or product th – Including control feature responsive to a test or measurement
Patent
1996-08-13
1998-10-06
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Including control feature responsive to a test or measurement
430296, G03C 500, G03F 900
Patent
active
058174427
ABSTRACT:
By causing a mask and a wafer to continuously move once or more and irradiating a plurality of small areas contained within a specific range of the mask in time sequence with a charged particle beam during each such continuous movement, the pattern in each small area is selectively projected onto a projection target area contained within a specific range of the wafer. The pattern to be projected onto one projection target area is divided and formed on a plurality of specific small areas contained within a specific range of the mask, and when the reduction ratio of the pattern projected from the mask onto the wafer is at 1/M, the continuous movement speed of the mask is set to be (N.times.M) times the continuous movement speed of the wafer (N being a real number larger than 1) and the charged particle beam to be conducted to the wafer is deflected in the direction of the continuous movement at a speed so that a relative speed of the pattern image which is projected onto the wafer and the wafer itself becomes substantially zero.
REFERENCES:
patent: 5079112 (1992-01-01), Berger
patent: 5130213 (1992-07-01), Berger
patent: 5166888 (1992-11-01), Engelke
patent: 5258246 (1993-11-01), Berger
patent: 5260151 (1993-11-01), Berger
patent: 5279925 (1994-01-01), Berger
patent: 5624774 (1997-04-01), Okino et al.
Nikon Corporation
Young Christopher G.
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