1992-10-06
1994-10-04
Nguyen, Phu K.
G06F 1520
Patent
active
053533950
ABSTRACT:
A pattern processing method is provided which performs the following steps with regard to a region in an n-dimensional space: providing a procedure (relative expression procedure) for generating relative positional data of any desired point in the n-dimensional space with respect to the region by the use of a series of data determining the region (the relative positional data including data indicating whether the point is inside or outside the region, the distance from the point to the boundary of the region, etc.), thereby identifying the region with the procedure, and thus unitarily determining the region; generating a relative expression procedure for a new region from the relative expression procedure(s) of one or more regions given the procedures, the relative expression procedure for the new region being obtained by configurationally processing and editing the one or more relatively expressed regions, thereby relatively expressing the new region; and expressing configurational characteristics of each relatively expressed region itself by the use of the relative expression procedure of the region. Thus, the processing of patterns in an n-dimenaional space can be unitarily effected on the basis of the one and only concept, that is, the relative expression procedures, without deponding upon the configuration of each particular region as being an object of processing so that the pattern processing method itself is simplified.
REFERENCES:
patent: 5113486 (1992-05-01), Luttmer
patent: 5197120 (1993-03-01), Saxton et al.
Anjyo Kenichi
Ishida Tomotoshi
Kawashima Yasumasa
Kunitomo Yoshio
Nakajima Norihiro
Hitachi , Ltd.
Nguyen Phu K.
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