Pattern position measuring apparatus

Details Pattern position measuring apparatus Pattern position measuring apparatus

1994-03-21

1995-01-31

Rosenberger, Richard A.

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

G01B 1100

Patent

active

053862945

ABSTRACT:
Position of a pattern of a sample placed on a stage is detected by detecting position of a pattern edge. Distortion of the whole sample surface is detected by measuring height of the sample, slope of the surface of the sample at a detected pattern edge position is calculated, and the detected position of the pattern edge is corrected in accordance with the calculated slope.

REFERENCES:
patent: 4112309 (1978-09-01), Nakazawa et al.
patent: 4730927 (1988-03-01), Otatake et al.
patent: 4849901 (1989-07-01), Shimizu

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