Pattern position detection apparatus using laser beam

Details Pattern position detection apparatus using laser beam Pattern position detection apparatus using laser beam

1985-12-13

1988-05-17

Evans, F. L.

Optics: measuring and testing

By polarized light examination

With light attenuation

2504611, 356 73, 356237, G01B 1100

Patent

active

047446633

ABSTRACT:
A pattern position detecting apparatus using a laser beam which is used for the recognition of an edge position, line width, etc., of a circuit pattern on a semiconductor wafer used in the fabrication of semiconductor devices. The apparatus includes an optical system for condensing a short-wave energy beam into a tiny spot and projecting it onto a sample, means for moving the sample and the spot relative to each other, first detecting means for receiving at least one of a reflection from a pattern and a scattering from a pattern edge, second detecting means for detecting a luminescence emitted from a pattern portion hit by the spot, and means for determining the position of the pattern in accordance with the detection information from the first and second detecting means and the scanning information of the spot.

REFERENCES:
patent: 4087685 (1978-05-01), Froot
patent: 4284897 (1981-08-01), Sawamura et al.
patent: 4441124 (1984-04-01), Heebner et al.

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