Pattern position detecting method and apparatus for detecting th

Details Pattern position detecting method and apparatus for detecting th Pattern position detecting method and apparatus for detecting th

1986-05-30

1988-10-11

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356401, G01N 2186

Patent

active

047773740

ABSTRACT:
A pattern position detecting method and an apparatus comprises spatial coherence variable means for illuminating a two-dimensional pattern formed on a wafer and its vicinity through a projection lens under the state that spatial coherence of pattern illumination light is elevated in one direction with respect to said two-dimensional pattern and lowered in the other direction perpendicular to said one direction. Two-dimensional reflection images from the pattern and its vicinity obtained through the lens are image-formed by an image-formation optical system. The intensity distribution of the two-dimensional reflection light is detected by light-intensity-distribution detection means so that a detection signal produced from this detection means indicates the position of the two-dimensional pattern.

REFERENCES:
patent: 4573791 (1986-03-01), Phillips
patent: 4592648 (1986-06-01), Tabarelli et al.
patent: 4597669 (1986-07-01), Terasawa et al.
patent: 4614432 (1986-09-01), Kuniyoshi et al.
patent: 4668089 (1987-05-01), Oshida et al.

Affiliated with

Also associated with

Rating

Pattern position detecting method and apparatus for detecting th does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern position detecting method and apparatus for detecting th, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern position detecting method and apparatus for detecting th will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1959773