Pattern optimization when measuring depth to a surface using len

Details Pattern optimization when measuring depth to a surface using len Pattern optimization when measuring depth to a surface using len

1985-03-04

1987-04-14

Rosenberger, R. A.

Optics: measuring and testing

By polarized light examination

With light attenuation

G01B 1124

Patent

active

046573933

ABSTRACT:
A pattern of light is projected upon a surface to be measured which may be devoid of surface detail. A sharply focused image of the surface provides distance discrimination. Although the projected pattern may be separate from the imaging optics, a common optics path removes distortion, provides maximum sensitivity and eliminates processing for misalignment between projector and imager. Sequential cross-correlation, synchronous detection or percent modulation processing methods may be readily implemented to develop three-dimensional coordinates relative to the sensor for all in-focus regions of the image. Refocusing the lens provides depth coverage. The amount of data can be increased by adapting the projected pattern to produce a maximum of detail in the direction of minimum rate of change of depth of the surface being measured.

REFERENCES:
patent: 3481672 (1969-12-01), Zoot
patent: 3606541 (1971-09-01), Sugano et al.
patent: 4153834 (1979-05-01), Hayamizu
patent: 4209252 (1980-06-01), Arditty et al.
patent: 4320462 (1982-03-01), Lund et al.

Affiliated with

Also associated with

Rating

Pattern optimization when measuring depth to a surface using len does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern optimization when measuring depth to a surface using len, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern optimization when measuring depth to a surface using len will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1781456