Pattern-matching sewing machine

Sewing – Stitch forming – Feeding work material

Patent

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Details

11212111, 112320, D05B 2706, D05B 2708

Patent

active

048981109

ABSTRACT:
A pattern-matching sewing machine that constantly samples photo-intensity data during calculation of a mismatch distance and during adjustment of the feeding mechanism based on the calculated mismatch distance. When the adjustment is finished, a new mismatch-distance calculation is quickly started, not by waiting for sampling new photo-intensity data of a predetermined number, but by using photo-intensity data of the predetermined number including the data thus sampled during the previous calculation and adjustment, and the previously stored data which have been used in the previous calculation.

REFERENCES:
patent: 4612867 (1986-09-01), Rosch et al.
patent: 4766828 (1988-08-01), Nomura et al.
patent: 4777896 (1988-10-01), Nomura

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