Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2005-08-22
2011-10-18
Tucker, Wesley (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S144000, C382S151000
Reexamination Certificate
active
08041104
ABSTRACT:
A pattern matching apparatus comprising: means for storing photographed image data of a semiconductor device; means for storing CAD data of said semiconductor device; an information input means for inputting information on the white band width contained in said image data; a pattern extracting means for extracting a pattern on the semiconductor device from said image data by using the white band width information; and a matching means for matching said pattern with the CAD data.
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Japanese Office Action, with partial translation, issued in Japanese patent Application No. 2008-150029, mailed Apr. 26, 2011.
Ikeda Mitsuji
Takane Atsushi
Toyoda Yasutaka
Hitachi High-Technologies Corporation
McDermott Will & Emery LLP
Tucker Wesley
Woldemariam Aklilu
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