Pattern management method and pattern management program

Details Pattern management method and pattern management program Pattern management method and pattern management program

2007-12-18

2011-12-27

Doan, Nghia (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Design of semiconductor mask or reticle

Analysis and verification

C716S050000, C716S052000, C716S053000, C716S054000, C716S055000, C430S005000, C430S030000

Reexamination Certificate

active

08086973

ABSTRACT:
A pattern management method includes extracting patterns having process margins equal to or below a predetermined value from a chip layout of an integrated circuit, screening a plurality of types of representative patterns from the extracted pattern, extracting patterns closest to the most outer periphery of the chip from the representative patterns, and representatively managing the extracted patterns which is closest to the most outer periphery of the chip.

REFERENCES:
patent: 5627625 (1997-05-01), Ogawa
patent: 6727028 (2004-04-01), Kotani et al.
patent: 6952818 (2005-10-01), Ikeuchi
patent: 7252910 (2007-08-01), Hasegawa et al.
patent: 7601471 (2009-10-01), Osawa et al.
patent: 2000-260706 (2000-09-01), None
patent: 2004-184633 (2004-07-01), None

Affiliated with

Also associated with

Rating

Pattern management method and pattern management program does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern management method and pattern management program, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern management method and pattern management program will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4314743