Pattern judging method, mask producing method, and method of div

Details Pattern judging method, mask producing method, and method of div Pattern judging method, mask producing method, and method of div

1994-06-09

1996-07-16

Boudreau, Leo

Image analysis

Applications

Manufacturing or product inspection

382173, 348 87, G06K 900

Patent

active

055374875

ABSTRACT:
A method of dividing a block pattern for use in a block exposure, to be implemented on a computer, divides an arbitrary block which is to be formed in a block mask that is used for the block exposure when the arbitrary block is judged as including a prohibiting pattern which is undesirable from a point of view of the block exposure. This method comprises the steps of (a) dividing the arbitrary block in a first direction to obtain a first block having a first dividing width along a second direction which is perpendicular to the first direction, (b) dividing a remaining block portion of the arbitrary block excluding the first block in the first direction to obtain a first divided portion having a second dividing width along the second direction, and merging the first dividing portion to the first block if the second dividing width is less than a predetermined width, and (c) searching the first block in the first direction after the step (b) and merging one of two adjacent first patterns within the first block to a second block if a pattern interval which is less than a predetermined value extends along the first direction between the first patterns.

REFERENCES:
patent: 4510616 (1985-04-01), Lougheed et al.
patent: 4811409 (1989-03-01), Cavan
patent: 5046012 (1991-09-01), Morishita et al.
patent: 5287290 (1994-02-01), Tabara et al.

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