Pattern judging method and mask producing method using the patte

Image analysis – Histogram processing – For setting a threshold

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382 1, 348 87, G06K 900

Patent

active

053475925

ABSTRACT:
A pattern judging method which is to be implemented on a computer automatically determines whether or not a pattern should be prohibited from being formed in a mask. The pattern judging method includes the steps of (a) dividing an area of the mask where a desired pattern is to be formed into a plurality of regions, (b) calculating a predetermined physical quantity for each of the regions for a case where one or a plurality of openings corresponding to the desired pattern are formed in the mask, and (c) prohibiting the desired pattern from being formed in the mask if the predetermined quantity calculated in the step (b) exceeds a threshold value for at least one of the regions.

REFERENCES:
patent: 5046012 (1991-09-01), Morishita et al.

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