Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2007-07-03
2007-07-03
Mehta, Bhavesh M (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S144000, C382S145000, C382S266000, C702S081000, C702S094000, C702S190000
Reexamination Certificate
active
09735840
ABSTRACT:
In this pattern inspection device, the optical scanning section scans the inspected pattern using a laser beam. A photoelectric image processing section generates an image of the inspected pattern. A reference image generation section calculates the gray level of each pixel according to the number of sub-pixels belonging to the pattern developed in each pixel and calculates the pattern width for the inspected pattern and the reference data with treating the count obtained by dividing the gray level by the gray level step count as the width of the pattern developed in that pixel.
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Dickstein , Shapiro, LLP.
Mehta Bhavesh M
NEC Corporation
Seth Manav
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