Pattern inspection method and inspection apparatus

Details Pattern inspection method and inspection apparatus Pattern inspection method and inspection apparatus

2005-12-27

2005-12-27

Bali, Vikkram (Department: 2623)

Image analysis

Applications

Manufacturing or product inspection

C382S144000

Reexamination Certificate

active

06980686

ABSTRACT:
A pattern inspection method and a pattern inspection apparatus, which are able to detect a killer defect as a defect candidate and also reduce considerably the number of non-killer defects detected as a defect candidate, have been disclosed, wherein a differential image of two patterns to be compared is calculated, with the polarities included, and after the absolute value of the differential image is compared with a first threshold value to detect the part as a defect candidate, the polarities of the differential image of the part of the defect candidate are inspected and the part of one of the polarities is judged as a defect candidate.

REFERENCES:
patent: 5850466 (1998-12-01), Schott
patent: 5949901 (1999-09-01), Nichani et al.
patent: 6347150 (2002-02-01), Hiroi et al.
patent: 6614924 (2003-09-01), Aghajan
patent: 2002/0181757 (2002-12-01), Takeuchi
patent: 10-89931 (1998-04-01), None
patent: 2000-172843 (2000-06-01), None

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