Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-02-24
2009-12-01
Mariam, Daniel G (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S149000
Reexamination Certificate
active
07627164
ABSTRACT:
A high-accuracy image correction device adaptable for use in pattern inspection apparatus is disclosed. The device includes a correction region designation unit which designates a correction region including a pattern and its nearby portion within each of an inspection reference pattern image and a pattern image under test. The device also includes an equation generator which generates by linear predictive modeling a set of simultaneous equations for a reference pattern image within the correction region and an under-test pattern image within the correction region, a parameter generator for solving the equations to obtain more than one model parameter, and a corrected pattern image generator for using the model parameter to apply the linear predictive modeling to the reference pattern image to thereby generate a corrected pattern image. A pattern inspection method using the image correction technique is also disclosed.
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Japanese office-action for application No. 2006/227348, Aug. 25, 2009.
Harabe Nobuyuki
Oaki Junji
Advanced Mask Inspection Technology Inc.
Mariam Daniel G
Oblon, Spivak, McClellland, Maier & Neustadt, L.L.P.
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