Pattern inspection apparatus, pattern inspection method, and...

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Electrical signal parameter measurement system

Reexamination Certificate

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C702S081000, C382S144000

Reexamination Certificate

active

07860675

ABSTRACT:
The present invention has an object of realizing a defect inspection estimated at high accuracy by preparing a reference image that reflects the change of the blur with time from a sampled image and design data. The present invention comprises a point spread function estimating section23for estimating a point spread function from an observation image and design information, a convolution image generating section31for generating a convolution image by convoluting the point spread function relative to the design information and a reference image generating section33for generating a reference image from the convolution image obtained by the convolution image generating section. binary image relative to “chromium on quartz glass”.

REFERENCES:
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patent: 2001-264263 (2001-09-01), None
patent: 2002-107309 (2002-04-01), None
Machine translation of JP 08247738 A.
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Duda, Richard, O., et al.; “Pattern Classification (2nd ed.)”, translated by Morio Onoe, 2003, pp. 111-113.
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