Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2010-08-06
2011-10-25
Carter, Aaron (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S199000, C382S209000, C348S086000, C348S125000, C356S237100
Reexamination Certificate
active
08045785
ABSTRACT:
A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing edges of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.
REFERENCES:
patent: 4583854 (1986-04-01), Lozar
patent: 4589139 (1986-05-01), Hada et al.
patent: 4805123 (1989-02-01), Specht et al.
patent: 4958374 (1990-09-01), Tokita et al.
patent: 5046109 (1991-09-01), Fujimori et al.
patent: 5046113 (1991-09-01), Hoki
patent: 5051585 (1991-09-01), Koshishiba et al.
patent: 5137362 (1992-08-01), LeBeau
patent: 5270796 (1993-12-01), Tokui et al.
patent: 5379350 (1995-01-01), Shimazu et al.
patent: 5398292 (1995-03-01), Aoyama
patent: 5479537 (1995-12-01), Hamashima et al.
patent: 5533144 (1996-07-01), Fan
patent: 5563702 (1996-10-01), Emery et al.
patent: 5574800 (1996-11-01), Inoue et al.
patent: 5600734 (1997-02-01), Okubo et al.
patent: 5764793 (1998-06-01), Omae et al.
patent: 5796868 (1998-08-01), Dutta-Choudhury
patent: 5801965 (1998-09-01), Takagi et al.
patent: 6023530 (2000-02-01), Wilson
patent: 6040911 (2000-03-01), Nozaki et al.
patent: 6047083 (2000-04-01), Mizuno
patent: 6049895 (2000-04-01), Sugimoto
patent: 6072897 (2000-06-01), Greenberg et al.
patent: 6222935 (2001-04-01), Okamoto
patent: 6356300 (2002-03-01), Shiba
patent: 6399953 (2002-06-01), Kitamura
patent: 6400839 (2002-06-01), Takayama
patent: 6504947 (2003-01-01), Nozaki et al.
patent: 6535621 (2003-03-01), Fujita
patent: 6539106 (2003-03-01), Gallarda et al.
patent: 6546308 (2003-04-01), Takagi et al.
patent: 6868175 (2005-03-01), Yamamoto et al.
patent: 7181059 (2007-02-01), Duvdevani et al.
patent: 7206443 (2007-04-01), Duvdevani et al.
patent: 7234128 (2007-06-01), Gau et al.
patent: 7388978 (2008-06-01), Duvdevani et al.
patent: 7796801 (2010-09-01), Kitamura et al.
patent: 7817844 (2010-10-01), Kitamura et al.
patent: 2004/0081350 (2004-04-01), Kitamura et al.
patent: 2004/0120571 (2004-06-01), Duvdevani et al.
patent: 2004/0126005 (2004-07-01), Duvdevani et al.
patent: 2005/0146714 (2005-07-01), Kitamura et al.
patent: 2005/0226494 (2005-10-01), Yamamoto et al.
patent: 2006/0245636 (2006-11-01), Kitamura et al.
patent: 19803021 (1998-07-01), None
patent: 0930499 (1999-07-01), None
patent: 63-88682 (1988-04-01), None
patent: 63088682 (1988-04-01), None
patent: 63-210606 (1988-09-01), None
patent: 03-235949 (1991-10-01), None
patent: 04-172239 (1992-06-01), None
patent: 4-194702 (1992-07-01), None
patent: 02299481 (1992-09-01), None
patent: 8-76359 (1996-03-01), None
patent: 08110305 (1996-04-01), None
patent: 09-312318 (1997-12-01), None
patent: 10307917 (1998-11-01), None
patent: 10312461 (1998-11-01), None
patent: 10-037364 (1999-08-01), None
patent: 11-231507 (1999-08-01), None
patent: 2001-338304 (2001-12-01), None
patent: 2002-515650 (2002-05-01), None
patent: 2002-310929 (2002-10-01), None
patent: 2003-100825 (2003-04-01), None
patent: WO 99/59200 (1999-11-01), None
Kitamura et al., “Die-to-Database Verification Tool for Detecting CD Errors, which are caused by OPC Features, by using Mass Gate Measurement and Layout Information”, Proc. of SPIE, vol. 6518 (2007), pp. 651834-1-651834-9.
Myron et al., “Defect Inspection for Imprint Lithography Using a Die to Database Electron Beam Verification System”, Proc. of SPIE vol. 6151 (2006), pp. 61510M-1-61510M-10.
U.S. Appl. No. 11/044,159, Notice of Allowance dated Sep. 25, 2009, 9 pages.
U.S. Appl. No. 11/044,159, Terminal Disclaimer dated Aug. 11, 2009, 3 pages.
U.S. Appl. No. 11/044,159, Response to Office Action dated Jul. 31, 2009, 13 pages.
U.S. Appl. No. 11/044,159, Office Action dated Jun. 12, 2009, 22 pages.
U.S. Appl. No. 11/044,159, Response to Office Action dated Mar. 25, 2009, 16 pages.
U.S. Appl. No. 11/044,159, Office Action dated Dec. 11, 2008, 20 pages.
U.S. Appl. No. 11/044,159, Response to Office Action dated Aug. 29, 2008, 16 pages.
U.S. Appl. No. 11/044,159, Office Action dated Apr. 30, 2008, 11 pages.
U.S. Appl. No. 09/648,372, Notice of Allowance dated Oct. 28, 2004, 7 pages.
U.S. Appl. No. 09/648,372, Response and Amendment dated Sep. 03, 2004, 14 pages.
U.S. Appl. No. 09/648,372, Office Action dated Jun. 3, 2004, 7 pages.
U.S. Appl. No. 09/648,372, Preliminary Amendment and Response to Restriction Requirement dated Mar. 18, 2004, 15 pages.
U.S. Appl. No. 09/648,372, Restriction Requirement dated Feb. 19, 2004, 5 pages.
U.S. Appl. No. 09/648,372, Response to Office Action dated Dec. 12, 2003, 31 pages.
U.S. Appl. No. 09/648,372, Office Action dated Aug. 13, 2003, 7 pages.
U.S. Appl. No. 11/058,616, Office Action mailed Aug. 14, 2009, 22 pages.
U.S. Appl. No. 11/058,616, Response to Office Action filed Nov. 09, 2009, 28 pages.
U.S. Appl. No. 11/987,766, Office Action mailed Jan. 15, 2010, 12 pages.
U.S. Appl. No. 11/987,766, Response to Office Action filed Apr. 14, 2010 23 pages.
U.S. Appl. No. 11/058,616 Notice of Allowance mailed Jun. 14, 2010, 6 pages.
U.S. Appl. No. 11/058,616 Response to Office Action filed Apr. 26, 2010, 26 pages.
U.S. Appl. No. 11/987,766 Restriction Requirement mailed May 20, 2010, 9 pages.
U.S. Appl. No. 11/987,766 Response to Restriction Requirement filed Jun. 20, 2010, 21 pages.
Hashimoto, M., et al., High-Speed Template Matching Algorithm Using Information of Contour Points, Systems and Computers in Japan, vol. 23, No. 9, 1992, pp. 78-87.
“Automatic Failure Part Tracing Method for a Logic LSI Using an Electron Beam Tester”, NEC Technical Report, vol. 50, No. 6, 1997, pp. 20-31 (partial English translation).
Robert M. Haralick et al., “Digital Step Edges from Zero Crossing of Second Directional Derivatives”, IEEE Transactions on Patiern Analysis and Machine Intelligence, vol. PAMI-6, No. 1, Jan. 1984, pp. 58-68.
Steger, C. et al., “An Unbiased Detector of Curvilinear Structures”, IEEE Transactions on Pattern Analysis and Machine Intelligence, vol. 20, No. 2, Feb. 1998, pp. 113-125.
Pavlidis, T.,et al., “Segmentation of Plane Curves”, IEEE Transactions on Computers, vol. C-23, No. 8, Aug. 1974, pp. 860-870.
Official Notice of Rejection, Japanese Patent Office, dated Feb. 21, 2003, for Patent Appln. No. 2000-258234, with English Translation.
U.S. Appl. No. 11/987,766, Restriction Requirement mailed Jul. 27, 2010, 7 pages.
U.S. Appl. No. 11/987,766, Response to Restriction Requirement filed Aug. 24, 2010, 17 pages.
U.S. Appl. No. 11/987,766, Advisory Action mailed Feb. 2, 2011, 3 pages.
U.S. Appl. No. 11/987,766, Response to Final Office Action filed Jan. 24, 2011, 18 pages.
U.S. Appl. No. 11/987,766, Examiner Interview Summary mailed Jan. 20, 2011, 3 pages.
U.S. Appl. No. 11/987,766, Examiner Interview Summary mailed Dec. 29, 2010, 3 pages.
U.S. Appl. No. 11/987,766, Final Office Action mailed Nov. 24, 2010, 8 pages.
U.S. Appl. No. 11/058,616, Office Action dated Jan. 13, 2010, 7 pages.
U.S. Appl. No. 11/434,797, Office Action dated Aug. 17, 2009, 18 pages.
U.S. Appl. No. 11/434,797, Response to Office Action filed Nov. 9, 2009, 18 pages.
U.S. Appl. No. 11/434,797, Office Action dated Jan. 15, 2010, 8 pages.
U.S. Appl. No. 11/434,797, Response to Office Action filed Apr. 14, 2010, 16 pages.
U.S. Appl. No. 11/434,797, Notice of Allowance dated May 10, 2010, 6 pages.
U.S. Appl.
Hasebe Toshiaki
Kitamura Tadashi
Kubota Kazufumi
Nakazawa Shin-ichi
Vohra Neeti
Carter Aaron
Lathrop & Gage LLP
NGR Inc.
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