Image analysis – Applications – Manufacturing or product inspection
Patent
1997-02-06
1999-11-09
Mancuso, Joseph
Image analysis
Applications
Manufacturing or product inspection
382190, 348126, 348129, G06K 900
Patent
active
059829222
ABSTRACT:
A pattern inspection apparatus includes a device for acquiring image data of a target inspection pattern, and an image processing unit for extracting a defect in the target inspection pattern on the basis of the image data and image data of a reference pattern. The image processing means performs image processing such that image data is prepared by reducing or increasing the pattern width of at least one of the pattern of a target inspection image represented by the image data of the target inspection pattern and the pattern of a reference image represented by the image data of the reference pattern to make the pattern width of the reference image smaller than that of the target inspection image, in this condition the target inspection image and the reference image are superposed and a portion where only the pattern of the reference image is present is extracted as a defect, image data is prepared by reducing or increasing the pattern width of at least one of the pattern of the target inspection image and the pattern of the reference image to make the pattern width of the reference image larger than that of the target inspection image, in this condition the target inspection image and the reference image are superposed and a portion where only the pattern of the target inspection image is present is extracted as a defect.
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Frederick, II Gilberto
Mancuso Joseph
Mitsui Mining & Smelting Co. Ltd.
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