Pattern inspection apparatus

Details Pattern inspection apparatus Pattern inspection apparatus

1997-02-06

1999-11-30

Kim, Robert H.

Optics: measuring and testing

Inspection of flaws or impurities

Having predetermined light transmission regions

356394, 348126, G01B 1102, H04N 718

Patent

active

059952164

ABSTRACT:
A pattern inspection apparatus for inspecting an abnormality in a pattern of a plurality of straight lines which are arranged in parallel in a direction perpendicular to the longitudinal direction includes a data acquisition means for acquiring, by photoelectric conversion, first and second image data of the straight lines on first and second lines which pass first and second points at different positions along the straight lines, respectively, and are perpendicular to the straight lines, and a data processing means for detecting the abnormality in the straight lines on the basis of a difference between the first and second image data. The pattern is a pattern of, e.g., inner leads of a TAB tape. When density changes of the first and second image data at a position x along the first and second lines can be approximated by sin.sup.2 x, the data processing means can detect the abnormality by using a relationship established between a phase difference and a density difference between the two changes.

REFERENCES:
patent: 5113565 (1992-05-01), Cipolla et al.
patent: 5452368 (1995-09-01), LeBeau
patent: 5490084 (1996-02-01), Okubo et al.
patent: 5617209 (1997-04-01), Svetkoff et al.
patent: 5648853 (1997-07-01), Stern et al.

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