Pattern generator using a dual phase step element and method...

Optical: systems and elements – Mirror – Plural mirrors or reflecting surfaces

Reexamination Certificate

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C359S223100

Reexamination Certificate

active

11878695

ABSTRACT:
A system and method are used to pattern light using an illumination system, an array of individually controllable components, and a projection system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The array of individually controllable elements comprises mirrors having first and second steps on opposite edges. The projection system projects the patterned beam onto a target portion of an object. In various examples, the object can be a display, a semiconductor substrate or wafer, a flat panel display glass substrate, or the like, as is discussed in more detail below.

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