Pattern generator mirror configurations

Details Pattern generator mirror configurations Pattern generator mirror configurations

2006-01-17

2006-01-17

Epps, Georgia (Department: 2873)

Optical: systems and elements

Optical modulator

Light wave temporal modulation

C291S027000, C345S085000, C348S771000

Reexamination Certificate

active

06987599

ABSTRACT:
The present invention relates to an apparatus for creating a pattern on a workpiece sensitive to radiation, such as a photomask a display panel or a microoptical device. The apparatus comprises a source for emitting electromagnetic radiation, a spatial modulator having multitude of modulating elements (pixels), adapted to being illuminated by said radiation, and a projection system creating an image of the modulator on the workpiece. It further comprises an electronic data processing and delivery system receiving a digital description of the pattern to be written, extracting from it a sequence of partial patterns, converting said partial patterns to modulator signals, and feeding said signals to the modulator, a precision mechanical system for moving said workpiece and/or projection system relative to each other and an electronic control system coordinating the movement of the workpiece, the feeding of the signals to the modulator and the intensity of the radiation, so that said pattern is stitched together from the partial images created by the sequence of partial patterns. According to the invention the drive signals can set a modulating element to a number of states larger than two.

REFERENCES:
patent: 4566935 (1986-01-01), Hornbeck
patent: 5148157 (1992-09-01), Florence
patent: 5296891 (1994-03-01), Vogt et al.
patent: 5467146 (1995-11-01), Huang et al.
patent: 5504504 (1996-04-01), Markandey et al.
patent: 5508841 (1996-04-01), Lin et al.
patent: 5539567 (1996-07-01), Lin et al.
patent: 5539568 (1996-07-01), Lin et al.
patent: 5661591 (1997-08-01), Lin et al.
patent: 5774254 (1998-06-01), Berlin
patent: 5835256 (1998-11-01), Huibers
patent: 6060224 (2000-05-01), Sweatt et al.
patent: 6142641 (2000-11-01), Cohen et al.
patent: 6285488 (2001-09-01), Sandstrom
patent: 6348907 (2002-02-01), Wood
patent: 6373619 (2002-04-01), Sandstrom
patent: 6399261 (2002-06-01), Sandstrom
patent: 6425669 (2002-07-01), Mei et al.
patent: 6428940 (2002-08-01), Sandstrom
patent: 6489984 (2002-12-01), Johnson
patent: 6504644 (2003-01-01), Sandstrom
patent: 6717097 (2004-04-01), Sandstrom et al.
patent: 2001/0040670 (2001-11-01), Fielding
patent: 2002/0153362 (2002-10-01), Sandstrom et al.
patent: 2003/0202233 (2003-10-01), Sandstrom
patent: 0 467 076 (1991-06-01), None
patent: WO 93/09469 (1993-05-01), None
patent: WO 98/04950 (1998-02-01), None
patent: WO 99/22262 (1999-05-01), None
patent: WO 99/45439 (1999-09-01), None
patent: WO 99/45441 (1999-09-01), None
patent: WO 00/42618 (2000-07-01), None
patent: WO 01/18606 (2001-03-01), None
patent: WO 01/79935 (2001-10-01), None
Olav Solgaard “Micromachining and Microfabrication Technology for Adaptive Optics” http://cfao.ucolick.org/past_meetings/Mems/ Nov. 15, 1999 consisting of 20 pages.
H. Kuck et al. “New System for Fast Submicron Laser Direct Writing” SPIE vol. 2440 Feb. 1995, pp. 506-514.

Affiliated with

Also associated with

Rating

Pattern generator mirror configurations does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern generator mirror configurations, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern generator mirror configurations will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3538895