Pattern generation methods and apparatuses

Details Pattern generation methods and apparatuses Pattern generation methods and apparatuses

2005-08-18

2009-02-10

Berman, Jack I (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C250S522100, C250S526000

Reexamination Certificate

active

07488957

ABSTRACT:
A method may comprise emitting electromagnetic radiation onto a workpiece and storing data describing geometrical elements in a pattern. The electromagnetic radiation may be focused and/or reflected in a first direction, and a power level of the electromagnetic radiation may be modulated according to the stored data. A guiding rail may be moved in the first direction and a carriage may be moved in a second direction, each in one of a continuous and stepwise manner. The second direction may be substantially perpendicular to the first direction. A pattern may be exposed on the workpiece.

REFERENCES:
patent: 4063103 (1977-12-01), Sumi
patent: 4445485 (1984-05-01), Chamness, Jr.
patent: 5495279 (1996-02-01), Sandstrom
patent: 6816302 (2004-11-01), Sandstrom et al.
patent: 6886154 (2005-04-01), Okuyama
patent: 7001481 (2006-02-01), Sandhu et al.
patent: 40 22 732 (1992-02-01), None
patent: WO 2004/074940 (2004-02-01), None
International Search Report (PCT/ISA/210).
International Preliminary Examination Report (PCT/IPEA/409).
Written Opinion (PCT/IPEA/408).

Affiliated with

Also associated with

Rating

Pattern generation methods and apparatuses does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Pattern generation methods and apparatuses, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern generation methods and apparatuses will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4106222