Pattern forming system

Details Pattern forming system Pattern forming system

1991-12-16

1994-04-19

Smith, Jerry

Boots, shoes, and leggings

355 53, 355 77, G03B 2732

Patent

active

053052226

ABSTRACT:
There is provided a pattern forming system of the present invention comprising a reticule on which a pattern is formed on one or more chips, an apparatus for preliminarily arranging a plurality of shot regions of a main surface of a wafer in a matrix manner in a case where regions where the pattern is formed by one shot are used as shot regions, an apparatus for calculating the number of the shot regions, which constitutes the matrix after sequentially moving the position of the shot regions to be a center of the matrix in a state that wafer is fixed, and the number of the chips wherein the pattern is completely formed on the main surface of the wafer, an apparatus for selecting a case in which the number of the shot regions constituting the matrix is the smallest and the number of the chips in which the pattern is completely formed on the main surface of the wafer is the largest, and an apparatus for forming the pattern, which is formed on the reticule, on each shot region constituting the matrix.

REFERENCES:
patent: 4488806 (1984-12-01), Takahashi et al.
patent: 4530587 (1985-07-01), Kosuqi et al.
patent: 4734746 (1988-03-01), Ushida et al.
European Search Report dated Sep. 11, 1992.

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