Pattern forming process

Details Pattern forming process Pattern forming process

1997-03-17

1999-03-23

Hightower, P. Hampton

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

From carboxylic acid or derivative thereof

528170, 430170, 430175, 430270, 430281, 4302831, 430286, 430289, 430297, 430299, C08G 7300, G03F 7037

Patent

active

058861360

ABSTRACT:
Disclosed herein is a pattern forming process comprising the steps of coating a substrate with a photosensitive resin composition comprising a polyamic compound having, at each terminal thereof, an actinic ray-sensitive functional group which has substituent groups each having a photopolymerizable carbon-carbon double bond, a photosensitive auxiliary having a photopolymerizable functional group, a photopolymerization initiator, and a solvent to form a film; subjecting the film to pattering exposure; and then developing the thus-exposed film with an alkaline developer or alkaline aqueous solution.

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patent: 5348835 (1994-09-01), Opa et al.
patent: 5518864 (1996-05-01), Opa et al.
Kubota et al. J. Macromol. Sci. -Chem. A24(12). pp. 1407-1422 (1987).

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