Pattern forming method utilizing first insulative and then condu

Details Pattern forming method utilizing first insulative and then condu Pattern forming method utilizing first insulative and then condu

1998-12-17

1999-11-30

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Registration or layout process other than color proofing

430296, 430328, 430942, G03F 900

Patent

active

059940077

ABSTRACT:
Disclosed is a pattern forming method, comprising the steps of providing a resist film, applying a light exposure to the resist film, with a film directly above the resist film and another film directly below the resist film being made insulative, applying a charged beam exposure to the resist film, with the film directly above the resist film and the other film directly below the resist film being made conductive, and developing the resist film to form a resist pattern.

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