Pattern forming method, pattern designing method, and mask set

Details Pattern forming method, pattern designing method, and mask set Pattern forming method, pattern designing method, and mask set

2009-09-10

2011-10-11

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S022000, C430S394000

Reexamination Certificate

active

08034515

ABSTRACT:
A pattern designing method according to an embodiment of the present invention includes: designing a first pattern for inspection formed by arraying a plurality of first mark rows, in which rectangular marks are arrayed at predetermined intervals in a first direction, in a second direction perpendicular to the first direction and designing a second pattern for inspection formed by arraying, in the second direction, a plurality of second mark rows in which rectangular marks are arranged among the marks arrayed in the first direction of the first mark row and a forming position in the second direction is arranged to overlap the first mark row by predetermined overlapping length.

REFERENCES:
patent: 6841321 (2005-01-01), Matsumoto et al.
patent: 2004/0119956 (2004-06-01), Fukagawa
patent: 2006/0117293 (2006-06-01), Smith et al.
patent: 2006/0139642 (2006-06-01), Van Bilsen
patent: 2008/0013176 (2008-01-01), Wang et al.
patent: 2008/0144036 (2008-06-01), Schaar et al.

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