Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Reexamination Certificate
2007-10-09
2007-10-09
McPherson, John A. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
C430S030000, C430S318000, C430S319000, C430S321000, C430S394000
Reexamination Certificate
active
10768998
ABSTRACT:
The invention relates to a pattern forming method, a method of manufacturing a TFT substrate, a method of manufacturing a liquid crystal display and an exposure mask and provides a pattern forming method, a method of manufacturing a TFT substrate, a method of manufacturing a liquid crystal display and an exposure mask which make it possible to provide a liquid crystal display having high display characteristics. In a pattern forming method for forming a resist pattern extending across a first divided exposure region and a second divided exposure region among a plurality of divided exposure regions on a substrate, a resist film is formed on the substrate; the resist film in the first divided exposure region is exposed using an exposure mask to form a latent image which defines one edge of a resist pattern in the vicinity of a boundary between the first divided exposure region and the second divided exposure region; the resist film in the second divided exposure region is exposed using another exposure mask to form a latent image which defines another edge of the resist pattern in the vicinity of the boundary; and the resist film is developed to form the resist pattern.
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Greer Burns & Crain Ltd.
McPherson John A.
Sharp Kabushiki Kaisha
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