Coating processes – Direct application of electrical – magnetic – wave – or... – Electrostatic charge – field – or force utilized
Reexamination Certificate
2008-07-01
2008-07-01
Berman, Susan W (Department: 1796)
Coating processes
Direct application of electrical, magnetic, wave, or...
Electrostatic charge, field, or force utilized
C430S286100
Reexamination Certificate
active
11086429
ABSTRACT:
The present invention provides a pattern forming method comprising bonding a compound to a substrate, the compound having both a polymerization initiating moiety capable of undergoing photocleavage to initiate radical polymerization and a substrate bonding moiety, contacting a radical-polymerizable unsaturated compound with the substrate, and exposing light thereto patternwise, so as to form a region where a graft polymer is generated and a region where a graft polymer is not generated. A conductive pattern forming method applying the pattern forming method, and a conductive pattern material obtained by the conductive film forming method.
REFERENCES:
patent: 4914004 (1990-04-01), Kohler et al.
patent: 5648201 (1997-07-01), Dulcey et al.
patent: 6436615 (2002-08-01), Brandow et al.
patent: 6447920 (2002-09-01), Chabrecek et al.
patent: 6878470 (2005-04-01), Kawamura et al.
patent: 2005/0208428 (2005-09-01), Kawamura et al.
patent: 2005/0214550 (2005-09-01), Kawamura
patent: 2828374 (1998-11-01), None
patent: 2002-273209 (2002-09-01), None
patent: 2004-31588 (2004-01-01), None
Y. Nakayama, et al., “Surface Macromolecular Microarchitecture Design: Biocompatible Surfaces via Photo-Black-Graft-Copolymerization Using N,N-Diethyldithiocarbarnate”, Langmuir 1999, 15, pp. 5560-5566.
Michael D. K. Ingall, et al., Surface Functionalization and Imaging Using Monolayers and Surface-Grafted Polymer Layers, Journal of American Chemical Society, 1999, 121, pp. 3607-3613.
Rahul R. Shah, et al., “Using Atom Transfer Radical Polymerization to Amplify Monolayers of Initiators Patterned by Microcontact Printing into Polymer Brushes for Pattern Transfer”, Macromolecules 2000, 33, pp. 597-605.
Ning Luo, et al., “A Methacrylated Photoiniferter as a Chemical Basis for Microlithography: Micropatterning Based on Photografting Polymerization”, Macromolecules 2003, 36, pp. 6739-6745.
R. Maoz et al.: “Constructive Nanolithography: Inert Monolayers as Patternable Templates for In-Situ Nanofabrication of Metal Semiconductor” Advanced Materials, vol. 12, No. 10, 2000, pp. 725-731, XP000958769.
Berman Susan W
FUJIFILM Corporation
Sughrue & Mion, PLLC
LandOfFree
Pattern forming method, arranged fine particle pattern... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pattern forming method, arranged fine particle pattern..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pattern forming method, arranged fine particle pattern... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3950581