Pattern forming method and projection exposure tool therefor

Details Pattern forming method and projection exposure tool therefor Pattern forming method and projection exposure tool therefor

1995-04-03

1997-04-15

Pendegrass, Joan H.

Photocopying

Projection printing and copying cameras

Step and repeat

355 67, 359558, H01L 2130

Patent

active

056214979

ABSTRACT:
Disclosed is a pattern forming method including the steps of preparing second grating stripes disposed near a reticle having a mask pattern to be projected, modulating the mask pattern by emission of a light, and demodulating the modulated mask pattern by first grating stripes formed within a photosensitive film made of a material capable of reversibly inducing photochemical reaction, thereby forming the modulated image of the mask pattern within a resist film disposed under the photosensitive film. With this method, various kinds of fine patterns each being smaller than the resolution limit of a projection exposure tool used are formed.

REFERENCES:
patent: 4835088 (1989-05-01), Gilson
patent: 5305054 (1994-04-01), Suzuki et al.
Applied Physics, vol. 37, No. 9 (1968), pp. 853-859.
p. 111, "Theory of Fourier Image-Formation" (Teruji Kose, issued by Kyoritsu Shuppan).

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